发明名称 Method for generating and visualizing an ion beam profile, treatment planning system and computer software
摘要 The invention relates to a method for generating and visualizing an ion beam profile, the method comprising the following steps: - Specifying an incidence direction (55) of a particle beam, - Specifying a target region (53) that is to be irradiated by said particle beam, - Creating an ion beam profile from points that are located on a downstream side (57) of said target region (53) or that are located in front of said target region (53) and project onto the contour of said target region (53) with respect to said incidence direction (55), - Displaying a graphical representation of said ion beam profile.
申请公布号 EP2087924(A1) 申请公布日期 2009.08.12
申请号 EP20080002307 申请日期 2008.02.07
申请人 SIEMENS AKTIENGESELLSCHAFT 发明人 MURALI, SHETTIHALLI
分类号 A61N5/10 主分类号 A61N5/10
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