| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a mask for inspection of an exposure apparatus, with which the state of an optical system in an exposure apparatus can be measured, and to provide a method for manufacturing a mask for inspection of an exposure apparatus with an efficient manufacturing process. <P>SOLUTION: The mask 20 for inspection includes first to fourth asymmetric diffraction grating patterns 200A to 200D varying in diffraction efficiency and generating +1-order diffracted light and -1-order diffracted light. The asymmetric diffraction grating area 200A includes a transmitting substrate 21, transflective halftone films 22 selectively and periodically laid at a prescribed pitch on the transmitting substrate 21, and a plurality of light-shielding films 23 formed on the respective halftone films 22. The halftone film 22 is formed to have a thickness that generates a phase difference at a value excluding 180°×n (wherein n is an integer of 0 or larger) between the phase of a first beam transmitting through only the transmitting substrate 21, and the phase of a second beam transmitting through the halftone film 22 and the transmitting substrate 21. <P>COPYRIGHT: (C)2009,JPO&INPIT |
