| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a polishing pad capable of preventing slurry leakage even when used for a long time, and a simple method for manufacturing the same. <P>SOLUTION: In the polishing pad, a polishing region, a cushion layer and a transparent support film are laminated in this sequence, and a light transmission region is provided in an opening penetrating the polishing region and the cushion layer and on the transparent support film. <P>COPYRIGHT: (C)2009,JPO&INPIT |
