| 摘要 |
A substrate processing apparatus and the processing method thereof are provided to reduce the scale of the total system and improve the productivity by performing a plurality of chambers under the same condition. The substrate(20) is inserted into one reference chamber(210) and one or more cascade chambers(310). Power is supplied to a plurality of chambers through the power supply unit(460). The temperature difference between a substrate of the standard chamber and a substrate of a subordinate chamber is corrected. The inner pressure of the subordinate chamber is controlled to be identical with the inner pressure of the standard chamber. The same gas density is supplied to a plurality of chambers.
|
