发明名称 SEMICONDUCTOR DEVICE AND FABRICATION PROCESS THEREOF
摘要 A semiconductor device includes: an insulated gate field effect transistor of a first conductivity type as a first transistor, the first transistor having a gate insulating film and a gate electrode; and an insulated gate field effect transistor of a second conductivity type opposite to the first conductivity type as a second transistor, the second transistor having a gate insulating film and a gate electrode.
申请公布号 US2009189224(A1) 申请公布日期 2009.07.30
申请号 US20080341364 申请日期 2008.12.22
申请人 SONY CORPORATION 发明人 MATSUMOTO KOICHI
分类号 H01L27/092;H01L21/8238 主分类号 H01L27/092
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