发明名称 ANTIREFLECTIVE COATING COMPOSITION AND PROCESS FOR IMAGING A PHOTORESIST USING IT
摘要 <p>The present invention relates to an antireflective coating composition comprising, (i) a thermal acid generator; (ii) a crosslinkable polymer comprising at least one aromatic group; and, (iii) a polymeric crosslinker comprising at least one unit of structure (6), where R11 to R13 is independently selected from H, (C1-C6) alkyl and aromatic group, R14 and R15 are independently (C1-C10) alkyl. The invention also relates to a process for imaging the antireflective coating composition of the present invention.</p>
申请公布号 EP2082287(A2) 申请公布日期 2009.07.29
申请号 EP20070825410 申请日期 2007.10.15
申请人 AZ ELECTRONIC MATERIALS USA CORP. 发明人 KIM, WOOKYU;WU, HENGPENG;ABDALLAH, DAVID J.;NEISSER, MARK;LU, PINGHUNG;ZHANG, RUZHI;RAHMAN, M., DALIL
分类号 G03F7/09 主分类号 G03F7/09
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