发明名称 WAFER PROTECTIVE COVER AND WAFER PROCESSING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a wafer protective cover capable of protecting periphery portions of a wafer from a foreign material, and a wafer processing method. SOLUTION: The wafer protective cover 10 includes: a primary cover body 11 which is fitted with a part of periphery portions of a silicon wafer W; and a secondary cover body 12 which is fitted with a remaining part of the periphery portions. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009158675(A) 申请公布日期 2009.07.16
申请号 JP20070334071 申请日期 2007.12.26
申请人 FUJITSU MICROELECTRONICS LTD 发明人 TAKEDA HIROSHI
分类号 H01L21/673 主分类号 H01L21/673
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