发明名称 PHOTOMASK MOUNTING/HOUSING DEVICE AND RESIST INSPECTION METHOD AND RESIST INSPECTION APPARATUS USING THE SAME
摘要 <p><P>PROBLEM TO BE SOLVED: To easily separate a reticle from a pellicle. <P>SOLUTION: A reticle cassette 4 is composed of two pieces of plate members 9, 10. A hollowed portion 9h with a shape allowing a reticle 2 to be inserted into the plate member 9 is formed, while another hollowed portion 10h having a shape being slightly larger than that of the resist 7 of the reticle 2 is formed on the plate member 10. Thus, recessed portions are formed in the plate 9 and the plate 10. A pellicle frame 8 is disposed in the circumference of the hollowed portion 10h, and a protective film 3f is formed in a stretched manner over the pellicle frame 8. The reticle 2 is housed in the recessed portion with the resist 7 of the reticle 2 directed toward the hollowed portion 10h. The resist 7 is put in sealed space. <P>COPYRIGHT: (C)2009,JPO&INPIT</p>
申请公布号 JP2009151197(A) 申请公布日期 2009.07.09
申请号 JP20070330488 申请日期 2007.12.21
申请人 NEC CORP 发明人 KATO YOSHIKAZU;IKETA TAKAHIRO;MORIBE HIDEMASA;HASEGAWA RYUJI
分类号 G03F1/84;H01L21/027 主分类号 G03F1/84
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