发明名称 ANISOTROPIC SCATTERING PLATE AND METHOD OF MANUFACTURING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide an anisotropic scattering plate suitable for use in building material by having excellent anisotropic scattering intensity and excellent light resistance and including glossy patterns having high rank feeling, and to provide a method of manufacturing the anisotropic scattering plate. SOLUTION: The anisotropic scattering plate includes a nano hole structure with a great number of nano holes formed substantially perpendicular to a horizontal face and a filler filled in each nano hole in the nano hole structure, and the filler is a transparent body. A refractive index difference ((A)-(B)) of a refractive index (A) of the nano hole structure and a refractive index (B) of the filler is preferably 0.1 or more. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009145410(A) 申请公布日期 2009.07.02
申请号 JP20070319835 申请日期 2007.12.11
申请人 FUJIFILM CORP 发明人 KAMATA AKIRA
分类号 G02B5/02;B82B1/00;B82B3/00;C23C26/00;G02B5/30 主分类号 G02B5/02
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