| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method of depositing a transparent optical film which can deposit a transparent optical film having a low refractive index at a high film deposition rate, and to provide the transparent optical film formed by the method of depositing the transparent optical film. <P>SOLUTION: The method of depositing the transparent optical film includes the step of depositing an optical film that is transparent on a substrate 11 by a reactive sputtering process using a Mg-Si metal target 4 in an atmosphere into which a gas 7 of a fluorine-containing compound is introduced and in which the total pressure is adjusted to 8 Pa or more. <P>COPYRIGHT: (C)2009,JPO&INPIT |
