| 摘要 |
<p>A manufacturing method of photomask is provided to increase the productivity by forming separately the first pattern engraved in photomask substrate and the second pattern carved in the substrate. A photoresist film is formed by coating the photoresist on a transparent mask substrate(200). The pattern arranged on the photomask has the line width which is greater than the desired line and space pattern. The first light-shielding layer pattern(204) is formed on the mask substrate. The second light-shielding layer(206) is formed by depositing the light-shielding substance. A photoresist film(208) is formed on the second light-shielding layer. Line and space pattern(410) is formed in a photomask(400). The first light-shielding layer pattern of intaglio has the space of 150nm and line of 50nm.</p> |
