发明名称 Gas distribution plate with annular plenum having a sloped ceiling for uniform distribution
摘要 A gas distribution plate for a plasma reactor has an annular gas distribution plenum with an array of gas injection holes and a gas injection port at one end of the annular plenum, the plenum being progressively constricted in cross-sectional area along its azimuthal path by a sloping ceiling.
申请公布号 US2009159002(A1) 申请公布日期 2009.06.25
申请号 US20070004448 申请日期 2007.12.19
申请人 BERA KALLOL;RAUF SHAHID 发明人 BERA KALLOL;RAUF SHAHID
分类号 C23C16/44;B05B1/18 主分类号 C23C16/44
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