发明名称 TAPE FOR WAFER PROCESSING
摘要 PROBLEM TO BE SOLVED: To provide a tape for wafer processing as an adhesive tape for surface protection that can secure processing precision of a wafer while relieving stress during grinding to some extent in a back grinding process, makes wafer warpage small after the back grinding, and less shrinks even when receiving a thermal history in various heating processes after grinding to give no damage to the wafer having been made thin. SOLUTION: Disclosed is a tape for wafer processing having an intermediate resin layer and an adhesive layer laminated in this order on a base film, wherein the intermediate resin layer has thickness of 20 to 200μm. Further, disclosed is a tape for wafer processing having an intermediate resin layer and an adhesive layer laminated in this order on a base film, which is made of a resin composition containing at least one kind of polymer selected from a group of polyethylene terephthalate, polyethylene naphthalate, polyphenylene sulfide, polyetherimide, and polyimide. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009141023(A) 申请公布日期 2009.06.25
申请号 JP20070314054 申请日期 2007.12.04
申请人 FURUKAWA ELECTRIC CO LTD:THE 发明人 OKA YOSHIFUMI;YANO SHOZO;ISHIWATARI SHINICHI
分类号 H01L21/683;C09J4/00;C09J7/02;C09J133/00;H01L21/304 主分类号 H01L21/683
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