发明名称 |
Alignment mark, use of a hard mask material, and method |
摘要 |
In a method to produce an alignment mark, an oxide layer and sacrificial layer are processed to comprise recesses. The recesses are filled with a filler material. During filling the recesses, a layer of filler material is formed on the sacrificial layer. The layer of filler material is removed by chemical mechanical polishing. The sacrificial layer protects the oxide layer during filling the recesses and removing the layer of filler material. The sacrificial layer is then removed by etching. This provides an unscratched oxide layer with protrusions. The oxide layer with protrusions is covered with a conducting layer whereby the protrusions punch through the oxide layer to form related protrusions. The related protrusions form an alignment mark.
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申请公布号 |
US7550379(B2) |
申请公布日期 |
2009.06.23 |
申请号 |
US20060544948 |
申请日期 |
2006.10.10 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
VAN HAREN RICHARD JOHANNES FRANCISCUS;MOS EVERHARDUS CORNELIS |
分类号 |
H01L21/4763 |
主分类号 |
H01L21/4763 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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