发明名称 INSPECTION DEVICE, AND DEFLECTION CONTROL CIRCUIT
摘要 PROBLEM TO BE SOLVED: To provide an SEM type inspection device improved in image quality and defect detection sensitivity by reducing pixel displacement when a two-dimensional image is formed by displacement of an electron beam irradiation position by deflection circuit noise generated in a constituent element of a beam deflection control circuit. SOLUTION: In the inspection device using an electron beam, an electron beam deflection control circuit includes a first deflection circuit part generating a signal of a component in an electron beam running direction, and a second deflection circuit part generating a signal of a component in the moving direction of an inspection object sample, and further includes a setting means for independently setting deflection circuit characteristics of the first and second deflection circuit parts. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009129746(A) 申请公布日期 2009.06.11
申请号 JP20070304305 申请日期 2007.11.26
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 IMAGAWA KENGO;RI UEN;TAKAHASHI MASAYOSHI;GUNJI YASUHIRO;FUNATSU RYUICHI
分类号 H01J37/147;H01L21/66 主分类号 H01J37/147
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