| 摘要 |
A dip coating apparatus including a substrate supporter which supports a substrate to be coated and which has a gas discharger which has a plurality of holes formed therein from which a gas is discharged; a gas supplying passage through which the gas is supplied to the gas discharger; and a gas supplying valve which is disposed at a position in the gas supplying passage and in which the gas is fed to the gas discharger when the gas supplying valve is opened, wherein a pressure loss in the gas discharger is greater than two times a pressure loss in the gas supplying passage between the gas supplying valve and the gas discharger.
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