METHOD AND ARRANGEMENT FOR REDUNDANT ANODE SPUTTERING HAVING A DUAL ANODE ARRANGEMENT

摘要

The invention relates to a method in which two anodes are operated alternately opposite each other as plasma discharge anodes and as cathodes for self-cleaning, and the cathodes of the plasma discharge are recurrently briefly reversed in polarity, and an arrangement comprising a cathode (3) and a first (1) and a second (2) anode supplied with voltage by means of an H-bridge circuit, with the object of increasing the efficiency of redundant anode sputtering having dual anodes, and increasing component reliability. The aim is achieved in that the DC current supply is designed as a pulse current supply (6), in that the pole reversal of the cathode voltage is effected by the pulse current supply, at least one anode being at positive potential at all times and the other anode being intermittently at negative potential during an etching time, and the H-bridge circuit being operationally connected to the pulse current supply, such that at least one anode is at positive potential at all times.