| 发明名称 |
A lithographic apparatus, a projection system and a device manufacturing method. |
| 摘要 |
A lithographic apparatus is disclosed that includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate, a vacuum chamber through which the patterned beam of radiation is projected during use, and a purge system configured to provide a purge gas flow in the chamber. |
| 申请公布号 |
NL1036181(A1) |
申请公布日期 |
2009.06.04 |
| 申请号 |
NL20081036181 |
申请日期 |
2008.11.11 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
YURI JOHANNES GABRIEL VAN DE VIJVER;JOHANNES HUBERTUS JOSEPHINA MOORS;WENDELIN JOHANNA MARIA VERSTEEG;PETER GERARDUS JONKERS |
| 分类号 |
G03F7/20;H01L21/027 |
主分类号 |
G03F7/20 |
| 代理机构 |
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| 主权项 |
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