Verfahren zur Injektion von Dotierstoff, n-leitender Silizium-Einkristall, Dotiervorrichtung und Ziehvorrichtung,申请号DE200711001701T-传众专利搜索

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发明名称	Verfahren zur Injektion von Dotierstoff, n-leitender Silizium-Einkristall, Dotiervorrichtung und Ziehvorrichtung
摘要
申请公布号	DE112007001701(T5)	申请公布日期	2009.06.04
申请号	DE200711001701T	申请日期	2007.07.20
申请人	SUMCO TECHXIV CORP., OMURA	发明人	KAWAZOE, SHINICHI;NARUSHIMA, YASUHITO;KUBOTA, TOSHIMICHI
分类号	C30B15/04	主分类号	C30B15/04
代理机构		代理人
主权项
地址

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