Metal organic compounds containing an amidinate ligand and their use for vapour phase deposition of metal containing thin films

摘要

Compound of the formula (I):
€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ€ƒ (R 1 NC(R 2 )NR 3 )M(=NR 4 ) y [(NR 5 R 6 )z 1 (NR 7 R 8 )z 2 ]
wherein,
y is an integer, y ‰¥ 1,
z 1 and z 2 are integers, z 1 ‰¥ 0 and z 2 ‰¥ 0,
and, 2y + z 1 + z 2 = 4;
M is a group V metal selected from Tantalum (Ta), Niobium (Nb) and Vanadium (V),
R 1 , R 2 , R 3 , R 4 , R 5 , R 6 , R 7 , and R 8 which may be identical or different, are independently chosen from Hydrogen atom, linear or branched alkyl groups having from one to six carbon atoms, linear or branched alkoxy groups having from one to six carbon atoms, linear or branched alkylamide groups having from one to six carbon atoms, linear or branched alkylsilylamide groups having from one to six carbon atoms, linear or branched alkylsilyl groups having from one to six carbon atoms.