| 摘要 |
<P>PROBLEM TO BE SOLVED: To accurately transfer a pattern onto a substrate by uzing an immersion method. <P>SOLUTION: Liquid is supplied by a supply mechanism 72 to a space between a lens 42 and a wafer W on a stage via a supply nozzle 36 on one side of the lens 42, and the liquid is recovered by a recovery mechanism 74 via a recovery pipe 52 on the other side of the lens 42. When the supply and the recovery of the liquid are performed in parallel, a predetermined amount of the liquid (exchanged at all times) is held between the lens 42 and the substrate W on the stage. Accordingly, when exposure (pattern transfer on the substrate) is performed in this state, an immersion method is applied and a pattern is transferred with good precision onto the substrate. In addition, in the case the liquid leaks out from under the lower edge 32g of a peripheral wall, the liquid that could not be recovered is recovered by an auxiliary recovery mechanism 76 via a slit 32h<SB>3</SB>or 32h<SB>4</SB>. Thus, the liquid does not remain on the substrate. <P>COPYRIGHT: (C)2009,JPO&INPIT |
