| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate pedestal for forming a uniform film in vacuum film forming. SOLUTION: A system includes a treatment chamber and a substrate supporting assembly which is at least partially arranged in the treatment chamber. The substrate supporting assembly is rotated by a motor, so that electricity, a cooling fluid, gas, and a vacuum are supplied to the rotational substrate supporting assembly in the treatment chamber from an external non-rotational source. The temperature of the substrate supported by the substrate supporting assembly is raised or lowered by using the cooling fluid and electrical connection. The electrical connection is also used for the electrostatic attraction of the substrate to the supporting assembly. One or a plurality of rotary seals are used for keeping treatment pressure and rotating the substrate assembly. The vacuum pump is connected to a tube connection mouth for attracting the substrate, and used for differential evacuation between a pair of rotational seals among two or more rotational seals. COPYRIGHT: (C)2009,JPO&INPIT |
