| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of manufacturing an insulation film having enhanced dielectric strength, a reactor, a power generation equipment and an electronic equipment. SOLUTION: A micro reactor 1 for causing reaction of a reactant is constituted by a top plate 2, a bottom plate 3 and the like being metal substrates, wherein an R<SB>2</SB>O<SB>3</SB>film (e.g.Y<SB>2</SB>O<SB>3</SB>film) having crystal structure of a rare-earth element R is formed as an insulation film 31 between the bottom plate 3 and a thin film heater 32 provided on the surface of the bottom plate 3. The R<SB>2</SB>O<SB>3</SB>film is formed by, after forming the R film on the surface of the bottom plate 3, forming an RH<SB>2</SB>film by hydrogenating the R film and further oxidizing it. COPYRIGHT: (C)2009,JPO&INPIT |
