| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method for simply and productively manufacturing an electrolytic polishing pad which has an excellent flattening characteristic, can restrain generation of a scratch, has high polishing speed and is hardly exfoliated between a polishing layer and a negative electrode layer. <P>SOLUTION: The manufacturing method for an electrolytic polishing pad includes a step of gluing the polishing layer 2a formed by laminating a resin layer 13 on one side of a tin sheet 11 and having a plurality of through-holes 17 penetrating the tin sheet and the resin layer, and the negative electrode layer 3, by using a thermoplastic resin, a thermoplastic elastomer, or a hot-melt adhesive. <P>COPYRIGHT: (C)2009,JPO&INPIT |
