| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus used in a lithography of semiconductor integrated circuits etc. which reduces or eliminates the fluctuation of the position of the system main body caused by the deformation of a vacuum chamber. <P>SOLUTION: The exposure apparatus includes a pole member provided upright on a foundation and a vacuum chamber containing airproof the apparatus body, and is characterized in that for allowing the displacement of a vacuum chamber upper wall from the pole member, the pole member and the vacuum chamber upper wall are resiliently connected through an elastic member. <P>COPYRIGHT: (C)2009,JPO&INPIT |
