PLASMA SUPPLY ARRANGEMENT

摘要

The invention relates to a plasma supply arrangement (200, 201, 202) having at least two plasma supply devices (10, 10a, 10b, 10c, 10d) for producing a power output of > 500 W at a substantially constant base frequency of > 3 MHz and for supplying power to a plasma process to which the produced power output is supplied, and from which reflected output is conducted back to the plasma supply devices (10, 10a, 10b, 10c, 10d) at least in the case of maladjustment, comprising at least one inverter (11, 12) connected to a DC power supply (13, 14, 13', 14'), the inverter having at least one switching element (11.1, 11.2, 12.1, 12.2), and having a base network (15, 15') each and at least one coupler (59), wherein the power supplies of the plasma supply devices (10, 10a, 10b, 10c, 10d) are consolidated via at least one coupler (59), wherein each base network (15, 15') has a dedicated power measurement device.