| 摘要 |
<P>PROBLEM TO BE SOLVED: To prevent liquid from penetrating into a gap of two substrate stages, when the liquid is moved from one substrate stage to the other substrate stage, while approaching the two substrate stages. <P>SOLUTION: An immersion exposure apparatus includes: first and second substrate stages WST1, WST2 which hold wafers and move; and a control section 12 which controls a pressure of liquid IML when moving the liquid IML from a spacing between one stage of the first and second substrate stages WST1, WST2 and a last side of a projection optical system 13 to a spacing between the other stage and the last side of the projection optical system 13. The control section 12 expands the spacing between the first and second substrate stages WST1, WST2 and the last side of the projection optical system 13 in a liquid movement rather than in exposing the wafer. <P>COPYRIGHT: (C)2009,JPO&INPIT |
