发明名称 |
Defect filtering optical lithography verification process |
摘要 |
An apparatus and method for optical lithography verification includes filtering a lithography simulation of proposed sub-lightwave pattern formations during at least one design phase or manufacturing phase of an article of manufacture having sub-lightwave structures and then detecting design phase or manufacturing phase defects in response to the filtering of the lithography simulation.
|
申请公布号 |
US7530048(B2) |
申请公布日期 |
2009.05.05 |
申请号 |
US20050102206 |
申请日期 |
2005.04.09 |
申请人 |
CADENCE DESIGN SYSTEMS, INC. |
发明人 |
JOSHI DEVENDRA |
分类号 |
G06F17/50 |
主分类号 |
G06F17/50 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|