发明名称 APPARATUS FOR ULTRASONIC CLEANING OF SUBSTRATE
摘要 An ultrasonic cleaning apparatus is provided to effectively remove particles of a micro size by oscillating ultrasonic waves having a different frequency. An ultrasonic cleaning apparatus(100) includes a cleaning bath(110) and a plurality of vibration generation parts(120). A floor surface of the cleaning bath is tilted into a V shape. The cleaning bath stores a cleaning solution. A plurality of vibration generation parts is included in an outer side of the floor surface. The vibration generation parts generate ultrasonic waves of a different frequency. The floor surface is formed by coupling a first surface with a second surface into a V shape. The first surface and the second surface has an angle of 90 ~ 180°.
申请公布号 KR20090041805(A) 申请公布日期 2009.04.29
申请号 KR20070107478 申请日期 2007.10.24
申请人 SILTRON INC. 发明人 PARK, JAE BYUNG
分类号 H01L21/304 主分类号 H01L21/304
代理机构 代理人
主权项
地址