发明名称 Photo sensitive composition, pattern-forming method using the photosensitive composition and compound for use in the photosensitive composition
摘要 A photosensitive composition, which comprises (A) a compound capable of generating an organic acid represented by formula (I) upon irradiation with actinic ray or radiation: <?in-line-formulae description="In-line Formulae" end="lead"?>Z-A-X-B-R-(Y)n (I)<?in-line-formulae description="In-line Formulae" end="tail"?> wherein Z represents an organic acid group; A represents a divalent linking group; X represents a divalent linking group having a hetero atom; B represents an oxygen atom or -N(Rx)-; Rx represents a hydrogen atom or a monovalent organic group; R represents a monovalent organic group substituted with Y, and when B represents -N(Rx)-, R and Rx may be bonded to each other to form a cyclic structure; Y represents -COOH or -CHO, and when a plurality of Y's are present, the plurality of Y's may be the same or different; and n represents an integer of from 1 to 3.
申请公布号 US7524609(B2) 申请公布日期 2009.04.28
申请号 US20070716054 申请日期 2007.03.09
申请人 FUJIFILM CORPORATION 发明人 WADA KENJI
分类号 G03F7/004;C07C69/62;C07C309/29;G03F7/30 主分类号 G03F7/004
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