发明名称 Oblique angle etched underlayers for improved exchange biased structures in a magnetoresitive sensor
摘要 A magnetoresistive sensor having improved pinning field strength. The sensor includes a pinned layer structure pinned by exchange coupling with an antiferromagnetic (AFM) layer. The AFM layer is constructed upon an under layer having treated surface with an anisotropic roughness. The anisotropic roughness, produced by an angled ion etch, results in improved pinning strength. The underlayer may include a seed layer and a thin layer of crystalline material such as PtMn formed over the seed layer. The magnetic layer may include a first sub-layer of NiFeCr and a second sub-layer of NiFe formed there over. The present invention also includes a magnetoresistive sensor having a magnetic layer deposited on an underlayer (such as a non-magnetic spacer) having a surface treated with an anisotropic texture. An AFM layer is then deposited over the magnetic layer. The magnetic layer is then strongly pinned by a combination of exchange coupling with the AFM layer and a strong anisotropy provided by the surface texture of the underlayer. Such a structure can be used for example in a sensor having a pinned layer structure formed above the free layer, or in a sensor having an in stack bias structure.
申请公布号 US7525775(B2) 申请公布日期 2009.04.28
申请号 US20050283033 申请日期 2005.11.17
申请人 HITACHI GLOBAL STORAGE TECHNOLOGIES NETHERLANDS B.V. 发明人 CAREY MATTHEW JOSEPH;CHILDRESS JEFFREY ROBINSON;FREITAG JAMES MAC;MAAT STEFAN;PINARBASI MUSTAFA MICHAEL
分类号 G11B5/39 主分类号 G11B5/39
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