发明名称 Pattern generator using a dual phase step element and method of using same
摘要 A system and method are used to pattern light using an illumination system, an array of individually controllable components, and a projection system. The illumination system supplies a beam of radiation. The array of individually controllable elements patterns the beam. The array of individually controllable elements comprises mirrors having first and second steps on opposite edges. The projection system projects the patterned beam onto a target portion of an object. In various examples, the object can be a display, a semiconductor substrate or wafer, a flat panel display glass substrate, or the like, as is discussed in more detail below.
申请公布号 US7520626(B2) 申请公布日期 2009.04.21
申请号 US20070878752 申请日期 2007.07.26
申请人 ASML HOLDING N.V. 发明人 BABA-ALI NABILA
分类号 G02B5/08 主分类号 G02B5/08
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