发明名称 |
Method of processing an organic-film |
摘要 |
A processing method according to the present invention coats a polar liquid film or forms an inorganic film on a surface of an organic film formed on a substrate as a protective film. The processing method comprises a modifying step of curing an organic film by irradiating the organic film with electron beams by means of an electron-beam irradiation device in a rare gas atmosphere, and an applying step of applying a polar liquid to the modified surface of the organic film or a film forming step of forming an inorganic film on the organic film. The organic film is cured and affinity for the polar liquid or the inorganic film is imparted to the organic film.
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申请公布号 |
US7521098(B2) |
申请公布日期 |
2009.04.21 |
申请号 |
US20030727038 |
申请日期 |
2003.12.04 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
MITSUOKA KAZUYUKI;ONISHI TADASHI;HONDA MINORU;ASAKO RYUICHI;IWASHITA MITSUAKI |
分类号 |
H01L21/283;H05B7/00;B05D1/00;B05D3/06;C23C14/30;H01L21/3105;H01L21/312 |
主分类号 |
H01L21/283 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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