| 摘要 |
An inductive coupling coil comprises a plenty of separate portions with the same structure. A plenty of separate portions are coaxial and are distributed symmetrically about an axes. An inductive coupling plasma apparatus which applies an inductive coupling coil comprises a reactive chamber, an dielectric window set on the reactive chamber, in which the inductive coupling coil is set on the dielectric window and is connected to an RF source via an RF adapter.
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