发明名称 LIQUID PROCESSING APPARATUS AND PROCESS LIQUID SUPPLYING METHOD
摘要 A liquid processing apparatus and process liquid supplying method are provided to accurately and quickly measure the concentration of the processing liquid by using the measuring unit for measuring the conductivity of the chemical solution. The processed article is processed by the processing liquid in the processing unit(80). The supply furnace(1) is connected to the processing unit. The solvent supply part(7) supplies solvent to the supply path. The chemical supply part(6) supplies the chemical solution to the supply path. The supply path is connected through connection points(25a, 35a, 45a) to the supply path. The measuring unit(10) is installed at the connection point and measures the conductivity of the drug solution. The additional chemical supply part(11) is connected to the downstream side of the measurement place.
申请公布号 KR20090032004(A) 申请公布日期 2009.03.31
申请号 KR20080094029 申请日期 2008.09.25
申请人 TOKYO ELECTRON LIMITED 发明人 KAMIKAWA YUJI;KITAHARA SHIGENORI
分类号 H01L21/302 主分类号 H01L21/302
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