POLYMER COMPOUND, PHOTORESIST COMPOSITION CONTAINING SUCH POLYMER COMPOUND, AND METHOD FOR FORMING RESIST PATTERN

摘要

Disclosed is a polymer compound which enables to obtain a highly sensitive photoresist composition which forms a fine pattern with excellent resolution and good rectangular shape and is capable of obtaining good resist characteristics even when the acid generated by an acid generator is weak. Also disclosed are a photoresist composition using such a polymer compound and a method for forming a resist pattern using such a photoresist composition. The photoresist composition and resist pattern-forming method use a polymer compound having an alkali-soluble group (i) which is at least one substituent selected from an alcoholic hydroxyl group, a carboxyl group and a phenolic hydroxyl group and protected by an acid-cleavable dissolution inhibiting group (ii) represented by the following general formula (1): (1) (wherein R1 represents an alicyclic group having 20 or less carbon atoms which may have an oxygen, nitrogen, sulfur or halogen atom; and n represents 0 or an integer of 1-5).