发明名称 Semiconductor Device with Multi-Layer Metallization
摘要 One or more embodiments are related to a semiconductor device, comprising: a metallization layer comprising a plurality of portions, each of the portions having a different thickness. The metallization layer may be a final metal layer.
申请公布号 US2009079080(A1) 申请公布日期 2009.03.26
申请号 US20070859799 申请日期 2007.09.24
申请人 INFINEON TECHNOLOGIES AG 发明人 STECHER MATTHIAS
分类号 H01L23/52;H01L21/4763 主分类号 H01L23/52
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