| 摘要 |
A transparent oxide electrode film comprises indium oxide containing titanium, in which indium in the indium oxide is substituted with titanium at a titanium/indium atomic ratio of 0.003-0.12. The indium oxide is crystalline. The electrode film has a resistivity of =5.7X10 -> 4>omega cm. Independent claims are also included for: (a) manufacturing a transparent oxide electrode film by sputtering method using a sputtering target manufactured from an oxide sintered body for which the constituent elements are indium, titanium, or oxygen; or a sputtering target manufactured from an oxide sintered body for which the constituent elements are indium, titanium, tungsten, and oxygen, at a substrate temperature of >=100[deg]C using mixed gas of argon and oxygen containing >=0.25% oxygen as the sputtering gas; (b) a solar cell having sequentially layered construction comprising substrate on which an electrode is provided, a conductive metal substrate, a light absorbing layer of p-type semiconductor, middle layer of an n-type semiconductor, a window layer, and an n-type transparent electrode layer; and (c) a photo detection element comprising a pair of electrodes and a layer of photo detection materials between the electrodes. |
