<p>A semiconductor device including line patterns is provided to obtain the desired dummy and operation line patterns by minimizing the interference of light in the isolation area. A semiconductor device comprises a dummy line pattern(115) located on a surface of substrate. The dummy line pattern is parallely arranged on the substrate along the first direction. The dummy line patterns have sub line pattern(110). The sub line pattern is subdivided by an isolation area(112). The isolation areas are arranged between sub line patterns.</p>
