| 摘要 |
An apparatus for vapor deposition of thin film is provided to prevent the generation of particles in a vacuum chamber by controlling the evaporation degree of the deposition material from a deposition chamber. An apparatus for depositing a thin film comprises a deposition chamber(20), a heating source(30), and an evaporation protection unit(40). The deposition chamber is positioned within a vacuum chamber(10). The deposition chamber has an opening in order to face a substrate. The deposition chamber accommodates the deposition material. A heating source is positioned at the neighboring of the deposition chamber and heats the deposition chamber.
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