发明名称 FERROMAGNETIC TUNNEL JUNCTION ELEMENT HAVING (Fe, Co, Ni)SiB FREE LAYER
摘要 <p>An MTJ element requiring a small current value for writing, and an MRAM and a spin transistor of low power consumption employing such MTJ element. The ferromagnetic tunnel junction element has such a structure as a ferromagnetic fixed layer including at least one ferromagnetic layer, an insulating layer, and a ferromagnetic free layer including at least one first ferromagnetic layer are laminated sequentially. The insulating layer is formed of MgO, the first ferromagnetic layer is an (Fe, Co, Ni)SiB ferromagnetic layer, the first ferromagnetic layer is contiguous to the insulating layer, the insulating layer and the first ferromagnetic layer are composed of single crystal or microcrystal and forming an epitaxial junction.</p>
申请公布号 WO2009031387(A1) 申请公布日期 2009.03.12
申请号 WO2008JP64455 申请日期 2008.08.12
申请人 ONO, TAKUYA;FUJI ELECTRIC HOLDINGS CO., LTD. 发明人 ONO, TAKUYA
分类号 H01L21/8246;H01L43/08;H01F10/16;H01F10/32;H01L27/105;H01L29/82 主分类号 H01L21/8246
代理机构 代理人
主权项
地址