| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an alkali developable photosensitive composition capable of effectively suppressing the occurrence of defects such as a pinhole and a chip in a line during patterning, and to provide a pattern made of a baked product of the composition and free of defects such as a pinhole and a chip in a line. <P>SOLUTION: The alkali developable photosensitive composition has (A) a carboxylic resin, (B) an inorganic component, (C) a compound having a radical polymerizable unsaturated group, and (D-1) a liquid phosphine oxide-based photopolymerization initiator. <P>COPYRIGHT: (C)2009,JPO&INPIT |
