发明名称 Zinn-Elektroplattierungsbad, Zinn-plattierter Beschichtungsfilm, Zinn-Elektroplattierungsverfahren, und Bauelement eines elektronischen Geräts
摘要 <p>Disclosed is a tin electroplating bath containing a water-soluble tin salt, one or more substances selected from inorganic acids, organic acids and their water-soluble salts, and one or more substances selected from water-soluble tungsten salts, water-soluble molybdenum salts and water-soluble manganese salts. This tin electroplating bath enables to form a tin-plated coating film on components for electronic devices such as a chip component, crystal oscillator, bump, connector, lead frame, hoop member, semiconductor package and printed board, as a substitute for a tin-lead alloy plating material, while having high whisker suppressing effects.</p>
申请公布号 DE112007000903(T5) 申请公布日期 2009.02.26
申请号 DE20071100903T 申请日期 2007.04.06
申请人 C. UYEMURA & CO. LTD. 发明人 YANADA, ISAMU;TSUJIMOTO, MASANOBU
分类号 C25D3/30 主分类号 C25D3/30
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