| 摘要 |
A sputtering target exhibiting a significantly enhanced initial stability, causing reduced arcings at the sputtering middle and last stages, and manufactured at low cost, its manufacturing method, and a sputtering method are provided. The sputtering target is used for sputtering and has a deposit on a non-erosion part. At least the layer near the interface of the deposit has a good crystallinity. Alternatively, the sputtering target is used for sputtering and there is substantially no gap between the deposit on a non-erosion part after energy of 50 Wh/cm2 or more is inputted and the sputter surface. The sputter surface of the target has a water-adsorptive layer.
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