发明名称 Module and method for producing extreme ultraviolet radiation.
摘要 A radiation source comprising a chamber and a supply of a plasma generating substance, the source having an interaction point at which the plasma generating substance introduced into the chamber may interact with a laser beam and thereby produce a radiation emitting plasma, wherein the source further comprises a conduit arranged to deliver a buffer gas into the chamber, the conduit having an outlet which is adjacent to the interaction point.
申请公布号 NL1035863(A1) 申请公布日期 2009.02.24
申请号 NL20081035863 申请日期 2008.08.25
申请人 ASML NETHERLANDS B.V. 发明人 TJARKO ADRIAAN RUDOLF VAN EMPEL;VADIM YEVGENYEVICH BANINE;VLADIMIR VITALEVICH IVANOV;ERIK ROELOF LOOPSTRA;JOHANNES HUBERTUS JOSEPHINA MOORS;JAN BERNARD PLECHELMUS VAN SCHOOT;YURI JOHANNES GABRIEL VAN DE VIJVER;GERARDUS HUBERTUS PETRUS MARIA SWINKELS;HENDRIKUS GIJSBERTUS SCHIMMEL;DZMITRY LABETSKI
分类号 H05G2/00;G03F7/20 主分类号 H05G2/00
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