发明名称 |
Dense coating formation by reactive deposition |
摘要 |
Methods for forming coated substrates can be based on depositing material from a flow onto a substrate in which the coating material is formed by a reaction within the flow. In some embodiments, the product materials are formed in a reaction driven by photon energy absorbed from a radiation beam. In additional or alternative embodiments, the flow with the product stream is directed at the substrate. The substrate may be moved relative to the flow. Coating materials can be formed with densities of 65 percent to 95 percent of the fully densified coating material with a very high level of coating uniformity.
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申请公布号 |
US7491431(B2) |
申请公布日期 |
2009.02.17 |
申请号 |
US20040017214 |
申请日期 |
2004.12.20 |
申请人 |
NANOGRAM CORPORATION |
发明人 |
CHIRUVOLU SHIVKUMAR;CHAPIN MICHAEL EDWARD |
分类号 |
C23C16/48;C23C16/06;C23C16/22;C23C16/30;C23C16/448 |
主分类号 |
C23C16/48 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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