发明名称 |
EXPOSURE EQUIPMENT, EXPOSURE METHOD, AND MANUFACTURING METHOD FOR A SEMICONDUCTOR DEVICE |
摘要 |
Provided is an exposure equipment having high resolution even when a reticle is inclined. The exposure equipment includes: an optical system for projecting on a wafer (130), a pattern formed on a surface of a reticle (101); a determining section for determining a tilt angle of the reticle (101) with respect to a plane perpendicular to an optical axis direction of the optical system; and an adjusting section for adjusting a position of the wafer (130) based on the tilt angle determined by the determining section.
|
申请公布号 |
US2009040484(A1) |
申请公布日期 |
2009.02.12 |
申请号 |
US20080186761 |
申请日期 |
2008.08.06 |
申请人 |
NEC ELECTRONICS CORPORATION |
发明人 |
HAYASHI SHOUICHIROU |
分类号 |
G03B27/68 |
主分类号 |
G03B27/68 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|