| 发明名称 |
METHOD AND SYSTEM FOR IMPROVING SIDEWALL COVERAGE IN A DEPOSITION SYSTEM |
| 摘要 |
Embodiments of a method and system for improving the consistency of a layer or a plurality of layers with a desired profile in a deposition system are generally described herein. Other embodiments may be described and claimed.
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| 申请公布号 |
US2009041950(A1) |
申请公布日期 |
2009.02.12 |
| 申请号 |
US20070835210 |
申请日期 |
2007.08.07 |
| 申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
MIZUNO SHIGERU;SAKUMA TAKASHI;MIZUSAWA YASUSHI |
| 分类号 |
H05H1/24;C23C16/00 |
主分类号 |
H05H1/24 |
| 代理机构 |
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