| 摘要 |
An exposure apparatus that exposes a substrate via liquid includes a substrate stage configured to hold the substrate and to move. The substrate stage includes a top plate, a substrate holder disposed on the top plate and configured to hold the substrate, and a support-plate holder disposed on the top plate as a separate body from the substrate holder and configured to hold a support plate while surrounding the substrate held by the substrate holder. The substrate holder includes an extension having a surface facing a back surface of the support plate held by the support-plate holder. The support-plate holder is provided with a collecting port therein through which liquid that has entered a gap between the back surface of the support plate and the surface of the extension is collected.
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