METHOD, APPARATUS AND KIT FOR MEASURING OPTICAL PROPERTIES OF MATERIALS

摘要

An apparatus for measuring an optical property of a sample, such as a directional emissivity or a directional hemispherical reflectivity, comprises a reference unit (15) having a reference surface of a predetermined directional emissivity, and a main chamber (4) and an auxiliary chamber (2), each said chamber defining an optical window (14, 12) providing an optical passage (13) between the chambers, wherein the main chamber (4) is configured to provide a region (15) for accomodating the reference unit (5) and the sample (S) and to screen said region from external radiation. The apparatus may further comprise a radiation source (3) provided in the auxiliary chamber (2) and an imager (16), e.g., an IR camera, focused on said region.